发明名称 METHOD OF MANUFACTURING THIN FILM TRANSISTOR, THIN FILM TRANSISTOR, AND DISPLAY UNIT
摘要 A thin film transistor having a crystalline silicon film that is formed over an insulating substrate with a gate electrode and a gate insulating film in between, and has a channel region in a region corresponding to the gate electrode; an insulating channel protective film that is selectively formed in a region corresponding to the channel region on the crystalline silicon film; an n+ silicon film having a source region and a drain region that sandwich a region corresponding to the channel region on the channel protective film and the crystalline silicon film; and a metal film having a source electrode and a drain electrode that respectively correspond to the source region and the drain region.
申请公布号 KR101410402(B1) 申请公布日期 2014.06.20
申请号 KR20070044602 申请日期 2007.05.08
申请人 发明人
分类号 H01L21/20;H01L21/336;H01L29/786;H01L51/50 主分类号 H01L21/20
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