| 摘要 |
The present invention relates to a method of forming a nanopattern by performing a rapid thermal process on an Au thin film. The method of forming a nanopattern by performing a rapid thermal process on an Au thin film according to one embodiment of the present invention includes a step of preparing a semiconductor substrate; a step of forming a metal thin film; a rapid thermal process step of forming metal particles on the metal thin film; a step of performing a dry etching process on the semiconductor substrate; a step of removing the metal particles; an impurity doping step; a step of forming a first electrode; and a step of forming a second electrode. |
