SUSCEPTOR FOR CHEMICAL VAPOR DEPOSITION DEVICE AND APPARATUS FOR CHEMICAL VAPOR DEPOSITION HAVING THE SAME

摘要

Disclosed are a susceptor for a chemical vapor deposition apparatus and the chemical vapor deposition apparatus having the same. The susceptor for the chemical vapor deposition apparatus comprises: a body having an inner receiving space formed in such a way that one side on which a substrate is seated is opened; a stepped jaw part formed with a predetermined stepped level along the circumference of the inner receiving space to support the substrate; and a thermal conductive material charged in the inner receiving space.