METHOD FOR REFORMING ELECTROSTATIC CHUCK, AND PLASMA PROCESSING DEVICE

摘要

The present invention provides a method for reforming an electrostatic chuck capable of controlling the fluorination of a surface of an electrostatic chuck, and a device for processing plasma. The method for reforming an electrostatic chuck (40) electrostatically absorbing an object to be treated comprises a gas supplying step where gas containing hydrogen (H) and oxygen (O) is supplied to a chamber (10) equipped with the electrostatic chuck (40) in which the surface is fluorinated; and a reforming step where the surface of the electrostatic chuck (40) is reformed by exposing the electrostatic chuck (40) to plasma by plasmarizing the supplied gas with high frequency power.