| 发明名称 |
LITHOGRAPHY SYSTEM AND LITHOGRAPHY METHOD |
| 摘要 |
A lithography system may include a wafer stage. The wafer stage may include a wafer mounting part configured to carry a wafer and configured to oscillate along a plane that is parallel to a top surface of the wafer in a wafer exposure process. The wafer stage may further include a driving device configured to affect an oscillatory movement of the wafer mounting part in the wafer exposure process. |
| 申请公布号 |
US2014168626(A1) |
申请公布日期 |
2014.06.19 |
| 申请号 |
US201313924325 |
申请日期 |
2013.06.21 |
| 申请人 |
Semiconductor Manufacturing International Corporation (Shanghai) |
发明人 |
WU Qiang |
| 分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A wafer stage comprising:
a wafer mounting part configured to carry a wafer and configured to oscillate along a plane that is parallel to a top surface of the wafer in a wafer exposure process; and a driving device configured to affect an oscillatory movement of the wafer mounting part in the wafer exposure process.
|
| 地址 |
Shanghai CN |
