发明名称 OXIDE SINTERED BODY AND SPUTTERING TARGET
摘要 An oxide sintered body includes indium oxide and gallium solid-solved therein, the oxide sintered body having an atomic ratio “Ga/(Ga+In)” of 0.001 to 0.12, containing indium and gallium in an amount of 80 atom % or more based on total metal atoms, and having an In2O3 bixbyite structure.
申请公布号 US2014167033(A1) 申请公布日期 2014.06.19
申请号 US201314085199 申请日期 2013.11.20
申请人 IDEMITSU KOSAN CO., LTD. 发明人 UTSUNO Futoshi;INOUE Kazuyoshi;KAWASHIMA Hirokazu;KASAMI Masashi;YANO Koki;TERAI Kota
分类号 H01L29/24;H01L21/02;H01L29/786 主分类号 H01L29/24
代理机构 代理人
主权项
地址 TOKYO JP