RAW MATERIAL FOR CLEANING AND CLEANING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a raw material for cleaning and a cleaning method capable of maintaining flatness of a sample holder by uniformly removing deposits on the sample holder regardless of place without newly generating particles.SOLUTION: In an XY plane, a plot expressing a combination between surface roughness X [μm] of a cleaning surface 11 of a raw material 1 for cleaning and flatness Y [μm] is included in a first designated range C1 expressed by 0.20≤X≤0.50 and 0.10≤Y≤0.40 or a second designated range C2 which is a part of the first designated range C1 and expressed by 0.30≤X≤0.40 and 0.20≤Y≤0.30.