| 摘要 |
PROBLEM TO BE SOLVED: To provide a polishing pad and its manufacturing method which hardly generate scratches on a surface of a material to be polished, excellent in dressing property, and have a polishing speed higher than the conventional one.SOLUTION: The polishing pad 1 is made of a polyurethane resin foam having fine bubbles, the polyurethane resin foam contains a polyurethane resin having an Asker D hardness of 20-60 degrees and a wear parameter of 1-3 and has a bubble number of 200/mmor more and an average bubble diameter of 50 μm or less. |
