发明名称 |
SOLUBLE POLYIMIDE, METHOD FOR PRODUCING PATTERNED CURED FILM USING THE SOLUBLE POLYIMIDE AND ELECTRONIC COMPONENT |
摘要 |
<p>PROBLEM TO BE SOLVED: To provide a polyimide compound which imparts sufficient mechanical characteristics even when subjected to heat treatment at a low temperature below 250°C.SOLUTION: There is provided a polyimide having a structural unit represented by the following formula. X is a n-methylenebisoxycarbonyl group (-COO(CH)OCO-) and may have a substituent; n is an integer of 1 to 10; Y is one of a plurality of groups selected from a di(trifluoromethyl)methylene group (-C(CF)-), a sulfonyl group (-SO-), a carbonyl group (-CO-), a dimethylmethylene group (-C(CH)-), an oxymethylene group (-CHO-) and a methylene group (-CH-) and may have a substituent.</p> |
申请公布号 |
JP2014111723(A) |
申请公布日期 |
2014.06.19 |
申请号 |
JP20130216736 |
申请日期 |
2013.10.17 |
申请人 |
HITACHI CHEMICAL DUPONT MICROSYSTEMS LTD |
发明人 |
MATSUKAWA DAISAKU;ENOMOTO TETSUYA;ONO TAKASHI |
分类号 |
C08G73/10;C08L79/08;G03F7/004;G03F7/023;H01L21/027 |
主分类号 |
C08G73/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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