发明名称 SOLUBLE POLYIMIDE, METHOD FOR PRODUCING PATTERNED CURED FILM USING THE SOLUBLE POLYIMIDE AND ELECTRONIC COMPONENT
摘要 <p>PROBLEM TO BE SOLVED: To provide a polyimide compound which imparts sufficient mechanical characteristics even when subjected to heat treatment at a low temperature below 250°C.SOLUTION: There is provided a polyimide having a structural unit represented by the following formula. X is a n-methylenebisoxycarbonyl group (-COO(CH)OCO-) and may have a substituent; n is an integer of 1 to 10; Y is one of a plurality of groups selected from a di(trifluoromethyl)methylene group (-C(CF)-), a sulfonyl group (-SO-), a carbonyl group (-CO-), a dimethylmethylene group (-C(CH)-), an oxymethylene group (-CHO-) and a methylene group (-CH-) and may have a substituent.</p>
申请公布号 JP2014111723(A) 申请公布日期 2014.06.19
申请号 JP20130216736 申请日期 2013.10.17
申请人 HITACHI CHEMICAL DUPONT MICROSYSTEMS LTD 发明人 MATSUKAWA DAISAKU;ENOMOTO TETSUYA;ONO TAKASHI
分类号 C08G73/10;C08L79/08;G03F7/004;G03F7/023;H01L21/027 主分类号 C08G73/10
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