发明名称 |
MASK INSPECTION APPARATUS AND METHOD OF CONTROLLING THE SAME |
摘要 |
A mask inspection apparatus includes a mask transfer unit configured to transfer a mask in one of a first direction and a direction opposite to the first direction, a displacement sensor unit configured to measure a distance to a sheet of the mask transferred by the mask transfer unit, a photographic unit configured to photograph the sheet of the mask transferred by the mask transfer unit, a control unit configured to send a height control signal for controlling a height of the photographic unit according to the measured distance, and a height control unit configured to control the height of the photographic unit according to the height control signal sent by the control unit. |
申请公布号 |
US2014168410(A1) |
申请公布日期 |
2014.06.19 |
申请号 |
US201313966271 |
申请日期 |
2013.08.13 |
申请人 |
Samsung Display Co., Ltd. |
发明人 |
Park Hun-Jung |
分类号 |
H04N5/232 |
主分类号 |
H04N5/232 |
代理机构 |
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代理人 |
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主权项 |
1. A mask inspection apparatus comprising:
a mask transfer unit configured to transfer a mask in one of a first direction and a direction opposite to the first direction; a displacement sensor unit configured to measure a distance to a sheet of the mask transferred by the mask transfer unit; a photographic unit configured to photograph the sheet of the mask transferred by the mask transfer unit; a control unit configured to send a height control signal according to the distance measured by the displacement sensor unit; and a height control unit configured to control the height of the photographic unit according to the height control signal sent by the control unit.
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地址 |
Yongin-City KR |