| 发明名称 |
CHARGED PARTICLE BEAM LENS AND EXPOSURE APPARATUS USING THE SAME |
| 摘要 |
An electrostatic charged particle beam lens includes an electrode including a flat plate having a first surface having a normal line extending in a direction of an optical axis and a second surface opposite to the first surface, the electrode having a through-hole extending from the first surface to the second surface. A circularity in a first region that is on the first surface side and a circularity in a second region that is on the second surface side are each better than a circularity in a third region that is a region in the electrode disposed between the first surface and the second surface. |
| 申请公布号 |
US2014166894(A1) |
申请公布日期 |
2014.06.19 |
| 申请号 |
US201214005187 |
申请日期 |
2012.03.14 |
| 申请人 |
Kato Takahisa;Setomoto Yutaka |
发明人 |
Kato Takahisa;Setomoto Yutaka |
| 分类号 |
G21K1/087 |
主分类号 |
G21K1/087 |
| 代理机构 |
|
代理人 |
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| 主权项 |
1. An electrostatic charged particle beam lens comprising:
an electrode including a flat plate having a first surface having a normal line extending in a direction of an optical axis and a second surface opposite to the first surface, the electrode having a through-hole extending from the first surface to the second surface, wherein, when an opening cross section is defined as a cross section of the though-hole taken along a plane perpendicular to the normal line, a circularity of the opening cross section in a first region that is on the first surface side and a circularity of the opening cross section in a second region that is on the second surface side are each better than a circularity of the opening cross section in a third region that is a region in the electrode disposed between the first surface and the second surface.
|
| 地址 |
Brookline MA US |
