DEPOSITION APPARATUS PROVIDING IMPROVED REPLACING APPARATUS FOR DEPOSITION RATE MEASURING SENSOR, AND REPLACING METHOD USING THE SAME

摘要

A deposition apparatus includes a vacuum chamber, a sensor head located in the vacuum chamber and including a plurality of deposition rate measuring sensors, a sensor extractor coupled to the vacuum chamber and including a first vacuum maintaining valve, the sensor extractor being configured to extract one of the deposition rate measuring sensors to outside the vacuum chamber, and a sensor inserter coupled to the vacuum chamber and including a second vacuum maintaining valve, the sensor inserter being configured to insert one of the deposition rate measuring sensors into the sensor head.

主权项

1. A deposition apparatus comprising:
a vacuum chamber; a sensor head located in the vacuum chamber and comprising a plurality of deposition rate measuring sensors; a sensor extractor coupled to the vacuum chamber and comprising a first vacuum maintaining valve, the sensor extractor being configured to extract one of the deposition rate measuring sensors to outside the vacuum chamber; and a sensor inserter coupled to the vacuum chamber and comprising a second vacuum maintaining valve, the sensor inserter being configured to insert one of the deposition rate measuring sensors into the sensor head.