发明名称 LASER HEAT TREATMENT DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a laser heat treatment device capable of preventing a substrate from being exposed to oxygen during crystallization heat treatment with a laser.SOLUTION: A laser heat treatment device comprises: a reaction chamber in which a substrate support base is disposed in an internal space and a window is provided on an upper surface thereof; a deoxidation module in which a slit-like jet slit is formed so as to jet an inert gas; a laser irradiator which irradiates the internal space of the reaction chamber with a laser beam via the window; a cylinder in which an incident slit which is long in a longitudinal direction is formed on a side wall; an inert gas jet pipe which is inserted into the cylinder and pours the inert gas into the jet slit and an inert gas supply pipe; a flowmeter which measures an injection quantity of the inert gas; a buffer flow passage in which one end thereof is connected to the jet slit and the other end thereof is connected to the incident slit; and injection control means for separately controlling the injection quantity of one end of the inert gas supply pipe and the injection quantity of the other end according to the injection quantity of the inert gas to be measured.
申请公布号 JP2014112670(A) 申请公布日期 2014.06.19
申请号 JP20130233135 申请日期 2013.11.11
申请人 AP SYSTEMS INC;SAMSUNG DISPLAY CO LTD 发明人 YANG SUNG HUI;SHIM HYUN KI;NA OK GYUN;AHN JIN YONG
分类号 H01L21/20;C01B33/02 主分类号 H01L21/20
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