发明名称 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESING COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM USING THE COMPOSITION, AND PATTERN FORMING METHOD
摘要 There is provided an actinic ray-sensitive or radiation-sensitive resin composition containing (A) a compound represented by the following formula (1-1); an actinic ray-sensitive or radiation-sensitive film using the composition; and a pattern forming method:;in the formula, R1, R2, R3, R4 and Y− are the same as those in formula (1-1) set forth in the description.
申请公布号 US2014170564(A1) 申请公布日期 2014.06.19
申请号 US201414184854 申请日期 2014.02.20
申请人 FUJIFILM Corporation 发明人 MATSUDA Tomoki;TOKUGAWA Yoko;SHIBUYA Akinori
分类号 G03F7/004;G03F7/20 主分类号 G03F7/004
代理机构 代理人
主权项 1. An actinic ray-sensitive or radiation-sensitive resin composition containing (A) a compound represented by the following formula (1-1): wherein R1 represents an alkyl group, an alkenyl group, an alkoxy group, an aliphatic cyclic group, an aromatic hydrocarbon group or a heterocyclic group, R2 represents a hydrogen atom, an alkyl group, an alkoxy group, an alkenyl group, an aliphatic cyclic group, an aromatic hydrocarbon group, a heterocyclic group, a cyano group or an alkoxycarbonyl group, R3 represents an alkylene group where one or more —CH2— groups may be substituted with an ether group, a carbonyl group, an ester group, an amide group, a methane group or a urea group, R4 represents an alkyl group, an alkenyl group, an aliphatic cyclic group, an arylcarbonylalkyl group, an aryloxycarbonylalkyl group or an alkoxycarbonylalkyl group, R1 and R2 may combine with each other to form a ring, and Y− represents an anion.
地址 Tokyo JP
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