发明名称 TRANSISTOR AND METHOD OF FABRICATING THE SAME
摘要 A field effect transistor includes an active layer and a capping layer sequentially stacked on a substrate, and a gate electrode penetrating the capping layer and being adjacent to the active layer. The gate electrode includes a foot portion adjacent to the active layer and a head portion having a width greater than a width of the foot portion. The foot portion of an end part of the gate electrode has a width less than a width of the head portion of another part of the gate electrode and greater than a width of the foot portion of the another part of the gate electrode. The foot portion of the end part of the gate electrode further penetrates the active layer so as to be adjacent to the substrate.
申请公布号 US2014167111(A1) 申请公布日期 2014.06.19
申请号 US201313912350 申请日期 2013.06.07
申请人 Electronics and Telecommunications Research Institute 发明人 AHN Hokyun;Lim Jong-Won;Kim Jeong-Jin;Kim Hae Cheon;Mun Jae Kyoung;Nam Eun Soo
分类号 H01L29/778;H01L29/66 主分类号 H01L29/778
代理机构 代理人
主权项 1. A field effect transistor comprising: an active layer and a capping layer sequentially stacked on a substrate; a source ohmic electrode and a drain ohmic electrode spaced apart from each other on the capping layer; and a gate electrode disposed on the substrate between the source and drain ohmic electrodes, the gate electrode penetrating the capping layer and adjacent to the active layer, wherein the gate electrode includes a foot portion adjacent to the active layer and a head portion disposed on the foot portion and having a width greater than a width of the foot portion; wherein the gate electrode includes both end parts in an extending direction of the gate electrode; wherein the foot portion of each of the both end parts of the gate electrode has a width less than a width of the head portion of another part of the gate electrode and greater than a width of the foot portion of the another part of the gate electrode; and wherein the foot portion of each of the both end parts of the gate electrode further penetrates the active layer so as to be adjacent to the substrate.
地址 Daejeon KR