| 发明名称 |
TiAgN COATING LAYER, TiAgN COATING METHOD AND TiAgN COATING APPARATUS |
| 摘要 |
Disclosed is a TiAgN coating layer, formed by subjecting a substrate having a surface roughness of about 0.05˜0.1 μm to plasma coating by periodically turning on/off an Ag source while a Ti source is continuously turned on in a nitrogen gas atmosphere, a TiAgN coating method, and a TiAgN coating apparatus. |
| 申请公布号 |
US2014170051(A1) |
申请公布日期 |
2014.06.19 |
| 申请号 |
US201313830250 |
申请日期 |
2013.03.14 |
| 申请人 |
HYUNDAI MOTOR COMPANY |
发明人 |
Hong Woong Pyo;Lyo In Woong;Kang Hyuk;Choi Kwang Hoon |
| 分类号 |
C23C14/06;C01B21/076 |
主分类号 |
C23C14/06 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A TiAgN coating method using a plasma coating process, comprising:
processing a surface of a substrate to form a surface roughness of 0.05˜0.1 μm; and introducing a nitrogen gas into a chamber in which the substrate is disposed, turning on a Ti source, and periodically turning an Ag source on and off, thus forming a TiAgN coating layer on the surface of the substrate.
|
| 地址 |
Seoul KR |
