| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a production method of a transparent conductive thin film capable of stable production by reducing dispersion of a resistance value of an obtained crystalline transparent conductive film.SOLUTION: In a production method of a transparent conductive thin film for forming a transparent conductive thin film on a transparent film base by a gas phase method by using a target mainly composed of indium oxide and tin oxide, a film is deposited in an argon atmosphere in which argon gas, nitrogen gas and steam gas are included, and the content of the nitrogen gas is in the range of 2,500 ppm-8,500 ppm to the argon gas, and the content of the steam gas is in the range of 1,450 ppm-13,500 ppm to the argon gas.</p> |
