| 发明名称 |
POWER SOURCE FOR A LITHOGRAPHIC APPARATUS, AND LITHOGRAPHIC APPARATUS COMPRISING SUCH A POWER SOURCE |
| 摘要 |
<p>Disclosed is a radiation source configured to generate a beam of EUV radiation by excitation of a fuel. The radiation source comprises a gas stream generation module which preconditions a droplet of the fuel by application of a high velocity gas stream to the droplet. Also disclosed is a lithographic apparatus comprising such a radiation source.</p> |
| 申请公布号 |
WO2014090480(A1) |
申请公布日期 |
2014.06.19 |
| 申请号 |
WO2013EP72927 |
申请日期 |
2013.11.04 |
| 申请人 |
ASML NETHERLANDS B.V. |
发明人 |
MESTROM, WILBERT;LABETSKI, DZMITRY;SWINKELS, GERARDUS |
| 分类号 |
G03F7/20;H05G2/00 |
主分类号 |
G03F7/20 |
| 代理机构 |
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