发明名称 Equipment for coating photo-resister spinner and loading/unloading method of wafer carrier at the same
摘要 A photo spinner apparatus, including a spin coater for coating a plurality of wafers with photoresist, a bake device for hardening the photoresist coated by the spin coater, a developer for developing the photoresist hardened in the bake device, a transfer unit for transferring the plurality of wafers between the developer, the bake device, and the spin coater, and an indexer including a wafer carrier loader to vertically stack a plurality of wafer carriers into which the plurality of wafers transferred by the transfer unit are loaded.
申请公布号 KR101409841(B1) 申请公布日期 2014.06.19
申请号 KR20080003290 申请日期 2008.01.11
申请人 发明人
分类号 H01L21/027;H01L21/68 主分类号 H01L21/027
代理机构 代理人
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