发明名称 SEMICONDUCTOR DEVICES INCLUDING A RESISTOR STRUCTURE
摘要 Semiconductor devices are provided. A semiconductor device may include a transistor area and a resistor area. The transistor area may include a gate structure. The resistor area may include an insulating layer and a resistor structure on the insulating layer. A top surface of the gate structure and a top surface of the resistor structure may be substantially coplanar.
申请公布号 US2014167180(A1) 申请公布日期 2014.06.19
申请号 US201314045034 申请日期 2013.10.03
申请人 Samsung Electronics Co., Ltd. 发明人 Xiong Junjie;Kim Yoon-Hae;Kang Hong-Seong;Lee Yoon-Seok;Choi You-Shin
分类号 H01L27/06 主分类号 H01L27/06
代理机构 代理人
主权项 1. A semiconductor device, comprising: a transistor area and a resistor area, wherein the transistor area comprises an active region in a substrate, and a gate structure on the active region, wherein the resistor area comprises a base insulating layer on a surface of the substrate, and a resistor structure on the base insulating layer, and wherein a top surface of the gate structure and a top surface of the resistor structure are substantially coplanar.
地址 Suwon-si KR