发明名称 |
SEMICONDUCTOR DEVICES INCLUDING A RESISTOR STRUCTURE |
摘要 |
Semiconductor devices are provided. A semiconductor device may include a transistor area and a resistor area. The transistor area may include a gate structure. The resistor area may include an insulating layer and a resistor structure on the insulating layer. A top surface of the gate structure and a top surface of the resistor structure may be substantially coplanar. |
申请公布号 |
US2014167180(A1) |
申请公布日期 |
2014.06.19 |
申请号 |
US201314045034 |
申请日期 |
2013.10.03 |
申请人 |
Samsung Electronics Co., Ltd. |
发明人 |
Xiong Junjie;Kim Yoon-Hae;Kang Hong-Seong;Lee Yoon-Seok;Choi You-Shin |
分类号 |
H01L27/06 |
主分类号 |
H01L27/06 |
代理机构 |
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代理人 |
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主权项 |
1. A semiconductor device, comprising:
a transistor area and a resistor area, wherein the transistor area comprises an active region in a substrate, and a gate structure on the active region, wherein the resistor area comprises a base insulating layer on a surface of the substrate, and a resistor structure on the base insulating layer, and wherein a top surface of the gate structure and a top surface of the resistor structure are substantially coplanar.
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地址 |
Suwon-si KR |