发明名称 ASSIST LIGHT PROJECTION APPARATUS, FLASH APPARATUS, AND PHOTOGRAPHING APPARATUS
摘要 The present invention relates to a technology for improving a robust property for the change of a focus distance in a pattern for detecting an auto focus. A fill light projection unit (32)(fill light projection apparatus) projects a pattern (P) for detecting the auto focus as fill light to enable a focus detection unit (16) to detect the auto focus by being mounted in a camera (10)(photographing apparatus) including the focus detection unit (16)(auto focus detection apparatus). The pattern (P) for detecting the auto focus includes a densified pattern area (Pc) which is more densified between a jo-pattern area (Pr) and a pattern area (Pm) more densified than the jo-pattern area (Pr). The centric coordinate (prc) of the jo-pattern area (Pr), the centric coordinate (pmc) of the pattern area (Pm), and the centric coordinate (pcc) of the densified pattern area (Pc) are separated from each other by considering time difference between the photographing lens (20)(photographing optical system) of a camera (10) and the projection system of the fill light projection unit (32) in the pattern (P) for detecting the auto focus.
申请公布号 KR20140075587(A) 申请公布日期 2014.06.19
申请号 KR20130135687 申请日期 2013.11.08
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KIMURA MAKOTO
分类号 G02B7/28;G03B13/36;G03B15/05;H04N5/232 主分类号 G02B7/28
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