发明名称 |
INSPECTION DEVICE USING CHARGED PARTICLE BEAM, AND METHOD OF MANUFACTURING DEVICE USING THE INSPECTION DEVICE |
摘要 |
<p>PROBLEM TO BE SOLVED: To prevent unevenness of a charge amount on a substrate surface.SOLUTION: An electron beam inspection device for inspecting a substrate W by using an electron beam includes: an electron gun 59-6 for irradiating an inspected area of the substrate W; a detector 59-4 for detecting electrons emitted from the substrate W; and a pre-charge unit 59-5. The pre-charge unit 59-5 is at least one of: means of irradiating an area including an inspection area with an electron beam before irradiation of an electron beam; means of coating the area including the inspection area with a conductive film before irradiation of an electron beam; means of spraying negative gas of argon, oxygen or the like onto the surface of the substrate W during inspection; and means 59-21 of performing adjustment so as to be in a negative charge mode having irradiation energy of 3-5 keV; and means of performing adjustment so as to inspect a reflection electron in irradiation energy of 0.5-3 keV.</p> |
申请公布号 |
JP2014112087(A) |
申请公布日期 |
2014.06.19 |
申请号 |
JP20130253948 |
申请日期 |
2013.12.09 |
申请人 |
EBARA CORP |
发明人 |
NOJI NOBUHARU;SATAKE TORU;SOFUGAWA TAKUJI;KANEUMA TOSHIFUMI;HATAKEYAMA MASAKI;YOSHIKAWA SEIJI;MURAKAMI TAKESHI;WATANABE KENJI;KARIMATA TSUTOMU;SUEMATSU KENICHI;TABE YUTAKA;TAJIMA RYO;TOYAMA KEIICHI |
分类号 |
G01N23/225;H01J37/20;H01L21/66 |
主分类号 |
G01N23/225 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|