发明名称 APPARATUS FOR PLASMA GENERATION, METHOD FOR MANUFACTURING ROTATING ELECTRODES FOR PLASMA GENERATION APPARATUS, METHOD FOR PLASMA TREATMENT OF SUBSTRATE, AND METHOD FOR FORMING THIN FILM OF MIXED STRUCTURE USING PLASMA
摘要 A plasma generator according to an embodiment of the present invention is provided to generate a high density and stable plasma at near atmospheric pressure by preventing a transition of plasma to arc. The plasma generator includes a plate-shaped lower electrode for seating a substrate; and a cylindrical rotating electrode above the plate-shaped lower electrode, wherein the cylindrical rotating electrode includes an electrically conductive body that is connected to a power supply and includes a plurality of capillary units on an outer circumferential surface of the electrically conductive body; and an insulation shield layer that is made of an insulation material or a dielectric material, exposes a lower surface of the plurality of capillary units, and shields other parts.
申请公布号 EP2744307(A2) 申请公布日期 2014.06.18
申请号 EP20120821442 申请日期 2012.08.10
申请人 KOREA INSTITUTE OF MACHINERY & MATERIALS 发明人 NAM, KEE-SEOK;KWON, JUNG-DAE;JEONG, YONG SOO;LEE, GUN HWAN;YOON, JUNG HEUM;LEE, SUNG HUN;KIM, DONG HO;KANG, JAE WOOK;PARK, SUNGGYU;KIM, CHANG SU
分类号 H05H1/34;C23C16/50;C23C16/503;C23C16/509;H01J9/02;H01J37/32;H01L21/205;H05H1/24;H05H1/48 主分类号 H05H1/34
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