发明名称 |
APPARATUS FOR PLASMA GENERATION, METHOD FOR MANUFACTURING ROTATING ELECTRODES FOR PLASMA GENERATION APPARATUS, METHOD FOR PLASMA TREATMENT OF SUBSTRATE, AND METHOD FOR FORMING THIN FILM OF MIXED STRUCTURE USING PLASMA |
摘要 |
A plasma generator according to an embodiment of the present invention is provided to generate a high density and stable plasma at near atmospheric pressure by preventing a transition of plasma to arc. The plasma generator includes a plate-shaped lower electrode for seating a substrate; and a cylindrical rotating electrode above the plate-shaped lower electrode, wherein the cylindrical rotating electrode includes an electrically conductive body that is connected to a power supply and includes a plurality of capillary units on an outer circumferential surface of the electrically conductive body; and an insulation shield layer that is made of an insulation material or a dielectric material, exposes a lower surface of the plurality of capillary units, and shields other parts. |
申请公布号 |
EP2744307(A2) |
申请公布日期 |
2014.06.18 |
申请号 |
EP20120821442 |
申请日期 |
2012.08.10 |
申请人 |
KOREA INSTITUTE OF MACHINERY & MATERIALS |
发明人 |
NAM, KEE-SEOK;KWON, JUNG-DAE;JEONG, YONG SOO;LEE, GUN HWAN;YOON, JUNG HEUM;LEE, SUNG HUN;KIM, DONG HO;KANG, JAE WOOK;PARK, SUNGGYU;KIM, CHANG SU |
分类号 |
H05H1/34;C23C16/50;C23C16/503;C23C16/509;H01J9/02;H01J37/32;H01L21/205;H05H1/24;H05H1/48 |
主分类号 |
H05H1/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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