发明名称 PROCESS FOR FORMING METAL FILM, AND PRODUCT EQUIPPED WITH METAL FILM
摘要 The purpose of the present invention is to provide a wiring substrate from which a metal film cannot be detached easily. A process for forming a metal film comprises a step (X) of applying an agent containing a compound (a) onto the surface of a base and a step (Y) of forming a metal film on the surface of the compound (a) by a wet-mode plating technique, wherein the compound (a) is a compound having either an OH group or an OH-generating group, an azide group and a triazine ring per molecule, and the base comprises a polymer.
申请公布号 EP2626448(A4) 申请公布日期 2014.06.18
申请号 EP20110830583 申请日期 2011.09.30
申请人 MORI, KUNIO;SULFUR CHEMICAL INSTITUTE INCORPORATED;MEIKO ELECTRONICS CO., LTD. 发明人 MATSUNO, YUSUKE;MORI, KATSUHITO;KUDO, TAKAHIRO;MICHIWAKI ,SHIGERU;MIYAWAKI, MANABU;MORI, KUNIO
分类号 C23C18/20;C25D5/34;C25D5/56;H05K3/38 主分类号 C23C18/20
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