发明名称 METHOD FOR CUTTING SUBSTRATE
摘要 <p>The present invention relates to a method for cutting a substrate which includes a Bessel beam forming step, a radiation step, and a transferring step. In the Bessel beam forming step, a laser beam having Gaussian energy distribution is formed into Bessel beam having a length of no less than the thickness of the substrate to be cut and a spot size of no greater than 10μm. In the radiation step, Bessel beam is radiated on the substrate to place the substrate within the extent of length of the Bessel beam. In the transferring step, the substrate or Bessel beam is horizontally transferred along the cutting line of the substrate.</p>
申请公布号 KR101407993(B1) 申请公布日期 2014.06.18
申请号 KR20130153454 申请日期 2013.12.10
申请人 LTS CO., LTD. 发明人 PARK, HONG JIN;SUH, JONG HYUN;YOO, SEUNG HYUP;KIM, YEONG GYU;YU, HUI JAE
分类号 B23K26/073;B23K26/08;B23K26/38 主分类号 B23K26/073
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