| 摘要 |
A method for generating a smooth surface 23 in a material-specimen 1, comprising: generating a substantially smooth, first surface region 21 by removing a first material-volume by particle beam etching, wherein the first material-volume is partially defined by the first surface region and wherein an angle between a beam direction 15 and a surface normal of the first surface region 21 is greater than 80° and smaller than 90°; and generating a substantially smooth, second surface region 23 by removing a second material-volume II, wherein the second material-volume is partially defined by the first surface region 21' and is partially defined by the second surface region 23 and wherein an angle ± between the beam direction 15 and a surface normal of the second surface region 23 is smaller than 60°. |
