| 摘要 |
<p>A method for manufacturing an optoelectronic device (100) is provided. The method includes providing a substrate (102). Thereafter, the method includes providing a lacquer layer (104) on the substrate (102). The method further includes providing light management texture in the lacquer layer (104). Providing light management texture in the lacquer layer (104) includes providing a replication substrate having a negative texture and imprinting the negative texture into the lacquer layer (104) using the replication substrate, such that the light management texture is created in the lacquer layer (104). Furthermore, the method includes providing a first electrode layer (108) on the lacquer layer (104). The method further includes etching, prior to deposition of first electrode layer (108), to enable formation of less steep light management texture in the lacquer layer (104) and subsequently less steep texture (202) on the first electrode layer (108) by etching at least one of the textures in the production of the negative texture on the replication substrate, or the light management texture on the lacquer layer (104) itself.
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