发明名称 |
Substrate transport apparatus and method, exposure apparatus and exposure method, and device fabricating method |
摘要 |
A method for exposing a substrate includes holding the substrate on a substrate holding member, irradiating, via a liquid, a light beam to the substrate on the substrate holding member, and removing, after the exposure of the substrate via the liquid, a liquid remained on the substrate before supporting the substrate by a transferring member. The transferring member transfers the exposed substrate from the substrate holding member to outside of the substrate holding member. |
申请公布号 |
US8755025(B2) |
申请公布日期 |
2014.06.17 |
申请号 |
US201112929591 |
申请日期 |
2011.02.02 |
申请人 |
Nikon Corporation;Zao Nikon Co., Ltd. |
发明人 |
Tanno Nobuyoshi;Horiuchi Takashi |
分类号 |
G03B27/52;G03B27/42;G03F7/20 |
主分类号 |
G03B27/52 |
代理机构 |
Oliff PLC |
代理人 |
Oliff PLC |
主权项 |
1. A method for exposing a substrate, the method comprising:
holding the substrate on a substrate holding member; irradiating, via a liquid and a projection optical system, a light beam to the substrate on the substrate holding member, the liquid being of an immersion area locally filling a space between the projection optical system and the substrate held by the substrate holding member, the immersion area covering a portion of an upper surface of the substrate that is smaller than an area of the upper surface of the substrate; and removing, after an exposure of the substrate via the liquid, a liquid separated from the immersion area and remained on the substrate before supporting the substrate by a transferring member, the transferring member transferring the exposed substrate from the substrate holding member to outside of the substrate holding member, wherein the remained liquid is removed by blowing a gas against the exposed substrate, and the blowing the gas takes place while moving the exposed substrate.
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地址 |
Tokyo JP |