发明名称 Semiconductor construct and manufacturing method thereof as well as semiconductor device and manufacturing method thereof
摘要 A semiconductor construct includes a semiconductor substrate and connection pads provided on the semiconductor substrate. Some of the connection pads are connected to a common wiring and at least one of the remaining of the connection pads are connected to a wiring. The construct also includes a first columnar electrode provided to be connected to the common wiring and a second columnar electrode provided to be connected to a connection pad portion of the wiring.
申请公布号 US8754525(B2) 申请公布日期 2014.06.17
申请号 US201313960485 申请日期 2013.08.06
申请人 Tera Probe, Inc. 发明人 Wakisaka Shinji;Wakabayashi Takeshi
分类号 H01L23/48;H01G4/228;H05K1/16;H01L23/28 主分类号 H01L23/48
代理机构 Holtz Holtz Goodman & Chick PC 代理人 Holtz Holtz Goodman & Chick PC
主权项 1. A semiconductor device comprising: a semiconductor substrate; integrated circuits formed on an upper surface of the semiconductor substrate; connection pads provided on the semiconductor substrate which are connected to the integrated circuits, the connection pads comprising common power supply voltage connection pads, common ground voltage connection pads, and normal voltage connection pads; a passivation film provided on the upper surface of the semiconductor substrate and having openings in regions corresponding to the connection pads; a protection film provided directly on an upper surface of the passivation film and having openings in regions corresponding to the connection pads; at least one first common wiring serving for a power supply voltage and provided solidly and directly on an upper surface of the protection film so as to be connected to the common power supply voltage connection pads via corresponding openings in the protection film and the passivation film; at least one second common wiring serving for a ground voltage and provided solidly and directly on the upper surface of the protection film so as to be connected to the common ground voltage connection pads via corresponding openings in the protection film and the passivation film; and at least two normal wirings each provided directly on the upper surface of the protection film so as to be connected to a normal voltage connection pad among the normal voltage connection pads via a corresponding opening in the protection film and the passivation film.
地址 Kanagawa JP