发明名称 |
Semiconductor device having gate in recess |
摘要 |
There are provided a semiconductor device which can be miniaturized without being deteriorated in characteristics, and a manufacturing method thereof. The semiconductor device includes a semiconductor substrate having a main surface, a source region and a drain region formed apart from each other in the main surface, a gate electrode layer formed over the main surface sandwiched between the source region and the drain region, a first conductive layer formed so as to be in contact with the surface of the source region, and a second conductive layer formed so as to be in contact with the surface of the drain region. A recess is formed in the main surface so as to extend from the contact region between the first conductive layer and the source region through a part underlying the gate electrode layer to the contact region between the second conductive layer and the drain region. |
申请公布号 |
US8754471(B2) |
申请公布日期 |
2014.06.17 |
申请号 |
US201113040610 |
申请日期 |
2011.03.04 |
申请人 |
Renesas Electronics Corporation |
发明人 |
Iwamatsu Toshiaki;Ishikawa Kozo;Kitazawa Masashi;Hayashi Kiyoshi;Maruyama Takahiro;Shinohara Masaaki;Kawai Kenji |
分类号 |
H01L29/76;H01L29/94;H01L31/062;H01L29/66;H01L29/78 |
主分类号 |
H01L29/76 |
代理机构 |
McDermott Will & Emery LLP |
代理人 |
McDermott Will & Emery LLP |
主权项 |
1. A semiconductor device, comprising:
a semiconductor substrate having a main surface; a source region and a drain region formed apart from each other in the main surface; a gate electrode layer formed over the main surface sandwiched between the source region and the drain region; a gate insulation film formed between the gate electrode layer and the semiconductor substrate; a first conductive layer formed in such a manner as to be in contact with a surface of the source region; a second conductive layer formed in such a manner as to be in contact with a surface of the drain region; and an element isolation film formed in the main surface of the semiconductor substrate, wherein a recess is formed in the main surface in such a manner as to extend from the contact region between the first conductive layer and the source region through a part underlying the gate electrode layer to the contact region between the second conductive layer and the drain region, the first conductive layer is in contact with a sidewall of the recess and a flat area of the source region above the recess and the second conductive layer is in contact with a sidewall of the recess and a flat area of the drain region above the recess, and the gate electrode layer extends into the semiconductor substrate below a top surface of the element isolation film, and the gate insulation film is located below the top surface of the element isolation film.
|
地址 |
Kanagawa JP |