发明名称 Substrate strip plate structure for semiconductor device and method for manufacturing the same
摘要 The present invention provides a strip plate structure and a method for manufacturing the same. The strip plate structure comprises a strip plate array, which comprises a plurality of strip plates arranged with spacing in a predetermined direction on a same plane, wherein each of the strip plates has a first surface and a second surface opposite to the first surface and the strip plate array is arranged on a plane parallel to the first surface of the strip plates; a plurality of strip sheets which connect neighboring ones of the strip plates; flexible material layers, which are located on at least a portion of the surfaces of the strip sheets and/or on at least a portion of the surfaces of the strip plates.
申请公布号 US8754503(B2) 申请公布日期 2014.06.17
申请号 US201213355946 申请日期 2012.01.23
申请人 Sunovel Suzhou Technologies Ltd. 发明人 Zhu Huilong;Luo Zhijiong;Yin Haizhou
分类号 H01L23/52;H01L21/768 主分类号 H01L23/52
代理机构 Troutman Sanders LLP 代理人 Troutman Sanders LLP
主权项 1. A method for manufacturing a strip plate structure for semiconductor devices, which comprises following steps: a) providing a substrate, which has a first surface and a second surface opposite to the first surface; b) patterning the first surface and the second surface of the substrate; c) forming at least two first trenches from the first surface of the substrate; and forming at least one second trench from the second surface of said substrate, wherein each of said second trench is located between two neighboring first trenches so as to form an upright strip plate array consisting of at least two strip plates and at least one strip sheet; d) forming flexible material layers on at least a portion of the surfaces of the strip sheets and/or on at least a portion of the surfaces of the strip plates of the upright strip plate array; and e) stretching the upright strip plate array to form a substantially planar strip plate array.
地址 Suzhou CN