SUBSTRATE SUPPORTING UNIT AND SUBSTRATE TREATING APPARATUS INCLUDING THE UNIT

摘要

Disclosed is a substrate supporting unit. The substrate supporting unit includes a susceptor having a pin hole and a gas supply hole on top; a lift pin positioned on the pin hole while being capable of moving vertically; and a gas supply line for supplying heat transfer gas to the gas supplying hole. Inside the susceptor, an exhaust flow passage, elongated from the pin hole to the outer surface of the susceptor, is formed.