| 摘要 |
A substrate deposition system is disclosed. The substrate deposition system according to an embodiment of the present invention comprises a substrate carrier having a chuck for chucking a substrate, and a stage for supporting a substrate arranged under the substrate carrier to support the substrate. The stage for supporting a substrate comprises a first substrate support unit lengthily arranged in a direction of crossing the center part of both sides of the substrate, but rising the substrate toward the substrate carrier; and second substrate support units arranged close to both sides of the first substrate support unit, but lengthily arranged in a direction of crossing the end of both sides of the substrate to support the substrate, and rising the substrate toward the substrate carrier at a distance of time from the first substrate support unit to rise the substrate while the center part of one side of the substrate is convexly curved as seeing one side of the substrate. |
