发明名称 Nonvolatile memory cells and methods of forming nonvolatile memory cells
摘要 A method of forming a nonvolatile memory cell includes forming a first electrode having a first current conductive material and a circumferentially self-aligned second current conductive material projecting elevationally outward from the first current conductive material. The second current conductive material is different in composition from the first current conductive material. A programmable region is formed over the first current conductive material and over the projecting second current conductive material of the first electrode. A second electrode is formed over the programmable region. In one embodiment, the programmable region is ion conductive material, and at least one of the first and second electrodes has an electrochemically active surface directly against the ion conductive material. Other method and structural aspects are disclosed.
申请公布号 US8753949(B2) 申请公布日期 2014.06.17
申请号 US201314048290 申请日期 2013.10.08
申请人 Micron Technology, Inc. 发明人 Ramaswamy D. V. Nirmal;Sandhu Gurtej S.
分类号 H01L21/20;H01L47/00 主分类号 H01L21/20
代理机构 Wells St. John, P.S. 代理人 Wells St. John, P.S.
主权项 1. A method of forming a nonvolatile memory cell, comprising: forming a first electrode comprising a first current conductive material and a second current conductive material different in composition from the first current conductive material within an opening in a dielectric material, at least a portion of the second current conductive material being laterally surrounded by the first current conductive material; elevationally etching the dielectric material in which the opening is received and elevationally etching the first current conductive material to leave second current conductive material projecting elevationally outward from the first current conductive material, the etching leaving all of the second current conductive material entirely within the elevational thickness of the dielectric material in which the opening is received; forming the second current conductive material to comprise a pair of second conductive material shoulders that are laterally inward of the first current conductive material; forming a programmable region over the first current conductive material and over the projecting second current conductive material of the first electrode; and forming a second electrode over the programmable region.
地址 Boise ID US