RESIST COMPOSITION, METHOD FOR PRODUCING RESIST PATTERN, METHOD FOR PRODUCING THICK FILM RESIST PATTERN, AND METHOD FOR PRODUCING CONNECTING TERMINAL

摘要

A resist composition including an acid generator useful in the resist composition, a method for forming a resist pattern, a method for forming a thick film resist pattern, and a method for forming a connection terminal are provided. The resist composition includes a resin composition (A) of which solubility with respect to a developing solution may change by the action of the acid, and an acid generator component (B) generating an acid by exposure. The acid generator component (B) includes an acid generator (B1) including a compound represented by the following General Formula (b1-1). [In the following Formula, R^1 and R^2 are a substitutable alkyl group having 1-10 carbon atoms, R^3 and R^4 are a substitutable alkyl group having 2-10 carbon atoms, and R^3 and R^4 may form a ring with a sulfur atom onto which R^3 and R^4 are attached. X is a counter anion.].