RESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN

摘要

A resist composition having improved sensitivity and lithography properties by using a novel photo sensitive quencher, and a method for forming a resist pattern by using the resist composition are provided. The resist composition is composed of a resin component (A) of which solubility with respect to a developing solution may change by the action of an acid and a photo sensitive quencher (D0). The photo sensitive quencher (D0) is characterized in including a compound (D0-1) represented by the following General Formula (d0). [In the following Formula, R^1 and R^2 are a substitutable alkyl group having 1-10 carbon atoms, R^3 and R^4 are a substitutable alkyl group having 2-10 carbon atoms, and R^3 and R^4 may form a ring with a sulfur atom onto which R^3 and R^4 are attached. X is a counter anion.].