| 摘要 |
<p>The substrate (100) with a transparent electrode includes a first dielectric material layer (21) mainly composed of SiO x , a second dielectric material layer (22) mainly composed of a metal oxide, a third dielectric material layer (23) mainly composed of SiO y , and a transparent electrode layer (4), in this order on at least one of the surfaces of a transparent film substrate (1). The transparent electrode layer (4) is patterned to have an electrode layer-formed part (4a) and an electrode layer non-formed part (4b). The transparent electrode layer (4) is a layer mainly composed of an indium-tin composite oxide and having a thickness of 20 nm to 35 nm. The refractive index n 1 of the first dielectric material layer, the refractive index n 2 of the second dielectric material layer, and the refractive index n 3 of the third dielectric material layer satisfy the relationship of n 3 < n 1 < n 2 . The first dielectric material layer (21), the second dielectric material layer (22) and the third dielectric material layer (23) each have specific thicknesses.</p> |
