发明名称 |
Reduction of edge chipping during wafer handling |
摘要 |
Methods and systems for reinforcing the periphery of a semiconductor wafer bonded to a carrier are disclosed. In one embodiment, additional adhesive is applied to the semiconductor wafer prior to bonding. The additional adhesive seeps into a crevice between the carrier and wafer and provides reinforcement. In another embodiment, adhesive is applied to the crevice by a dispenser after the wafer is bonded to the glass carrier. |
申请公布号 |
US8753460(B2) |
申请公布日期 |
2014.06.17 |
申请号 |
US201113015638 |
申请日期 |
2011.01.28 |
申请人 |
International Business Machines Corporation |
发明人 |
Knickerbocker Sarah H.;Griffith Jonathan H. |
分类号 |
B32B37/02 |
主分类号 |
B32B37/02 |
代理机构 |
|
代理人 |
Cohn Howard M.;MacKinnon Ian D. |
主权项 |
1. A method for reducing edge chipping on a semiconductor wafer having a wafer radius, comprising the steps of:
a) spinning the semiconductor wafer in an apply tool at a speed ranging from 10 rpm to 50 rpm; b) dispensing an adhesive in a center zone on a top surface of the semiconductor wafer, wherein the center zone has a center zone radius ranging between 0.1 times the wafer radius to 0.4 times the wafer radius; c) spinning the semiconductor wafer in the apply tool at a speed ranging from about 800 rpm to about 2000 rpm, followed by; d) spinning the semiconductor wafer in the apply tool at a speed ranging from about 10 rpm to about 50 rpm; e) dispensing said adhesive in an outer zone on the top surface of the semiconductor wafer, wherein the outer zone comprises a region between the wafer radius and a second radius, wherein the second radius ranges between 0.8 times the wafer radius to 0.99 times the wafer radius, and wherein said adhesive comprises a polyimide adhesive; f) spinning the semiconductor wafer in the apply tool at a speed ranging from about 800 rpm to about 2000 rpm; and g) disposing a glass carrier onto the top surface of the semiconductor wafer, thereby forming a glass-wafer structure comprising a crevice between the glass carrier and the semiconductor wafer, and forming an adhesive accumulation in the crevice.
|
地址 |
Armonk NY US |