发明名称 APPARATUS FOR TREATING SUBSTRATES
摘要 To provide a substrate processing apparatus preventing damage caused by excessive curving of a lower end in the rear of carrying direction of a substrate carried in a given tilted angle. This substrate processing apparatus processing the substrate with a processing liquid while carrying it in a given tilted angle, is provided with chambers 3; support rollers 14 provided in the chambers and supporting a rear face of the lower side of the tilted direction of the substrate; drive rollers 17 supporting the lower end of the substrate supported by the support rollers at the lower ends with the outer peripheries and rotated to carry the substrate in the given direction; nozzle bodies 62 spraying the processing liquid to the front face of the upper side in the tilted direction of the substrate; and curving preventive rollers 64 disposed near the drive rollers and preventing curving of the lower end of the substrate toward the rear face side of the substrate, when the lower end in the rear part of the carrying direction receives the pressure of the processing liquid sprayed from the nozzle bodies.
申请公布号 KR101408758(B1) 申请公布日期 2014.06.17
申请号 KR20070072911 申请日期 2007.07.20
申请人 发明人
分类号 G02F1/13 主分类号 G02F1/13
代理机构 代理人
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