发明名称 High density thyristor random access memory device and method
摘要 Memory devices and methods of making memory devices are shown. Methods and configurations as shown provide folded and vertical memory devices for increased memory density. Methods provided allow trace wiring in a memory array to be formed on or near a surface of a memory device.
申请公布号 US8754443(B2) 申请公布日期 2014.06.17
申请号 US201213621002 申请日期 2012.09.15
申请人 Micron Technology, Inc. 发明人 Mathew Suraj J.;Mouli Chandra
分类号 H01L29/74 主分类号 H01L29/74
代理机构 Schwegman, Lundberg & Woessner, P.A. 代理人 Schwegman, Lundberg & Woessner, P.A.
主权项 1. A memory cell, comprising: a first type doped semiconductor base having two upward facing ends and a folded conduction path therebetween; a pair of second type doped semiconductor structures coupled vertically to the first type doped semiconductor base to form a first and second p-n junction along the conduction path; a first type doped semiconductor top structure to form a third p-n junction along the conduction path; and a gate located only between the first and second p-n junctions, wherein the gate is adjacent to at least one side of the first type doped semiconductor base.
地址 Boise ID US
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