Imprint lithography

摘要

An imprint lithography apparatus is disclosed that has a first array of template holders, a second array of template holders, and a substrate table arranged to support a substrate to be imprinted, wherein the first array of template holders is arranged to hold an array of imprint templates that can be used to imprint a first array of patterns onto the substrate, and the second array of template holders is arranged hold an array of imprint templates that can be used to imprint a second array of patterns onto the substrate, the patterns imprinted by the second array being interspersed between the patterns imprinted by the first array.

主权项

1. An imprint lithography method, comprising:
imprinting a first array of templates onto a substrate using an array of template holders holding the first array of templates to form a first array of patterns imprinted by the first array of templates; moving the substrate from the first array to a second array of templates at a different separate location from the first array, or laterally moving the second array of templates to the substrate, or both the moving the substrate and the moving the second array of templates; and imprinting the second array of templates onto the substrate using an array of template holders holding the second array of templates to form a second array of patterns imprinted by the second array of templates, the patterns imprinted by the second array of imprint templates being interspersed between the patterns imprinted by the first array of imprint templates and being imprinted after the patterns imprinted by the first array of imprint templates between which the respective patterns of the second array of imprint templates are interspersed.