发明名称 SUBSTRATE PROCESSING APPARATUS
摘要 <p>A gas flow of a gas pipe is indicated before an electromagnetic valve is actually opened, so that the electromagnetic valve can be prevented from being opened or closed by a wrong manipulation or hazards caused by undesired mixing of gases can be avoided so as to improve safety. The substrate processing apparatus includes a state detection unit configured to detect an opening/closing request state and an opening/closing state of a valve installed at a gas pipeline; and a indication unit configured to indicate a gas flow state of the gas pipeline predicted according to the opening/closing request state and a gas flow state of the gas pipeline when the valve is opened, in a way that each state is distinguished.</p>
申请公布号 KR101407931(B1) 申请公布日期 2014.06.17
申请号 KR20120063032 申请日期 2012.06.13
申请人 发明人
分类号 H01L21/02;H01L21/205;H01L21/22 主分类号 H01L21/02
代理机构 代理人
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