| 摘要 |
An object of the present invention is to supply a fresh cleaning liquid, in an optimal way, to a cleaning area on a surface of a substrate where a roll cleaning member and the surface of the substrate are brought into contact with each other when a surface of a substrate, which is rotating in a horizontal state, is cleaned by bringing a roll cleaning member into contact with the surface of the substrate and even when the surface of the substrate is hydrophobic, thereby cleaning the surface of the substrate efficiently with a high cleaning level. The substrate cleaning apparatus of the present invention includes a first chemical liquid supply nozzle (60) including a nozzle configured to supply a chemical liquid toward an area on one side of a substrate (W) so that the chemical liquid is brought into contact with the surface of the substrate in a first contact area (60a) extending in an elongated shape; a second chemical liquid supply nozzle (62) including a nozzle configured to supply a chemical liquid toward the area on one side of the substrate so that the chemical liquid is brought into contact with the surface of the substrate in a second contact area (62a) spreading in an elliptical shape at an upstream along the rotational direction of the first contact area of the substrate; and a rinse liquid supply nozzle (64) is arranged so that a rinse liquid is brought into contact with the substrate at an upstream of the second contact area along the rotational direction of the substrate. |
