发明名称 |
SPUTTERING TARGET AND METHOD FOR PRODUCING SAME |
摘要 |
<p>A sputtering target which is made of an alumina sintered body having a purity of not less than 99.99% by mass %, a relative density of not less than 98%, and an average grain size of less than 5μm or is made of an alumina sintered body having a purity of not less than 99.999% by mass % and a relative density of not less than 98%. A sputtered film having an excellent insulation resistance and an excellent homogeneity can be obtained by using the sputtering target.</p> |
申请公布号 |
KR20140073570(A) |
申请公布日期 |
2014.06.16 |
申请号 |
KR20147012231 |
申请日期 |
2012.04.10 |
申请人 |
FERROTEC CERAMICS CORPORATION |
发明人 |
OKAMOTO KEN;ARAHORI TADAHISA;SATO AKISHIGE;MIYASHITA SACHIO;KUSANO EIJI;SAKAMOTO MUNEAKI |
分类号 |
C23C14/34;B22F3/14;C04B35/111 |
主分类号 |
C23C14/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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