| 摘要 |
The present invention relates to a method for manufacturing a substrate with a nanopattern. The method for manufacturing a substrate with a nanopattern according to the present invention comprises: a sacrificial layer laminating step of laminating a sacrificial layer on a substrate; a pattern layer laminating step of laminating a pattern layer on the sacrificial layer; a protrusion pattern forming step of forming a protrusion pattern which is formed to protrude while neighboring on the pattern layer; a flat layer laminating step of laminating a flat layer between the protrusion pattern and protrusion pattern neighboring; an etching step of etching the sacrificial layer and protrusion pattern located on the lower side of the flat layer and protrusion pattern; a material layer laminating step of laminating a material layer on the exposed substrate and flat layer; and a nanopattern forming step of forming a nanopattern protruding from the exposed substrate and neighboring on the exposed substrate. Accordingly, the present invention provides the method for manufacturing a substrate with a nanopattern which improves the efficiency of a device since the upper side of a nanostructure finally formed is formed in order to be flat by forming a reverse slope in which the length of the upper side is longer than the length of the lower side when the pattern layer is etched. |
