发明名称 INSPECTION METHOD OF APPARATUS FOR PROCESSING SUBSTRATE
摘要 A method for inspecting a substrate treatment apparatus according to the present invention includes a process treatment step of successively performing a first process and a second process on a process substrate in at least one process chamber among process chambers of the substrate treatment apparatus; a step of lowering a corresponding process chamber when the accumulation processing number of a process substrate among the process chambers exceeds a preset number in the process treatment step; and a test step of performing a test process by loading a test substrate to the lowered process chamber.
申请公布号 KR20140072647(A) 申请公布日期 2014.06.13
申请号 KR20120140401 申请日期 2012.12.05
申请人 SEMES CO., LTD. 发明人 LIM, SUNG MIN
分类号 H01L21/66 主分类号 H01L21/66
代理机构 代理人
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