| 摘要 |
PURPOSE: A plasma generator and a processing method using the same are provided to effectively execute a vacuum evaporation without a lithography process. CONSTITUTION: A plasma generator comprises a first electrode (120), a target (130), and a plurality of second electrodes (150a, 150b, 150c). The first electrode includes a plurality of conductive patterns (124). The target is arranged on the first electrode by directly connecting to a part of the conductive patterns. The plurality of the second electrodes is separated from the target, and atmospheric pressure is individually generated with the target. |
