| 摘要 |
PROBLEM TO BE SOLVED: To provide a film deposition apparatus capable of: uniformly depositing a film on a film-deposited object; being manufactured and maintained at a low cost with a simple structure; and using a chamber efficiently to reduce film-deposition cost.SOLUTION: A film-deposition apparatus is provided, in which a stage 6 for mounting a film-deposited object H thereon is arranged on a rotary body 7 provided inside a chamber 2. The rotary body 7 is configured to rotate about a perpendicular rotating shaft 10 by predetermined drive mechanisms 11 and 13, and is provided with an inclination part 15 at an upper part thereof. The stage 6 is slidably arranged on the inclination part 15, and is engaged to a fixing member 25 inside the chamber 2 via a predetermined swinging mechanism 8 so as not to rotate with respect to the chamber 2. |
