MANUFACTURING METHOD FOR SOLAR CELL AND SOLAR CELL MANUFACTURING SYSTEM

摘要

The invention includes: a first process of forming a texture structure on both surfaces of a semiconductor substrate of a first conductivity type; a second process of measuring a reflectance distribution of the both surfaces of the semiconductor substrate on which the texture structure is formed; a third process of forming an impurity diffusion layer, in which an impurity element of a second conductivity type is diffused, on one of the both surfaces of the semiconductor substrate which is narrower in the reflectance distribution; a fourth process of forming, on the impurity diffusion layer, a light receiving surface-side electrode having a predetermined pattern and electrically connected to the impurity diffusion layer; and a fifth process of forming a back surface-side electrode on another of the both surfaces of the semiconductor substrate which is wider in the reflectance distribution.

主权项

1. A manufacturing method for a solar cell comprising:
a first process of forming a texture structure on both surfaces of a semiconductor substrate of a first conductivity type; a second process of measuring a reflectance distribution of the both surfaces of the semiconductor substrate on which the texture structure is formed; a third process of forming an impurity diffusion layer, in which an impurity element of a second conductivity type is diffused, on one of the both surfaces of the semiconductor substrate which is narrower in the reflectance distribution; a fourth process of forming, on the impurity diffusion layer, a light receiving surface-side electrode having a predetermined pattern and electrically connected to the impurity diffusion layer; and a fifth process of forming a back surface-side electrode on another of the both surfaces of the semiconductor substrate which is wider in the reflectance distribution, wherein the fourth process comprises: identifying a first defective appearance region that is attributed to a formation state of the texture structure on a side of the one surface of the semiconductor substrate; determining an orientation of the light receiving surface-side electrode from among a plurality of orientations in which the light receiving surface-side electrode is potentially arranged, such that a larger area of overlap between the first defective appearance region and the pattern of the light receiving surface-side electrode is obtained; and forming the light receiving surface-side electrode.