| 发明名称 |
AG ALLOY FILM, AG ALLOY CONDUCTIVE FILM, AG ALLOY REFLECTIVE FILM, AG ALLOY SEMI-TRANSMISSIVE FILM, AND SPUTTERING TARGET FOR FORMING AG ALLOY FILM |
| 摘要 |
<p>The present invention relates to an Ag alloy film, an Ag alloy conductive film, an Ag alloy reflective film, an Ag alloy semi-transmissive film and a sputtering target for forming an Ag alloy film. This Ag alloy film is characterized by having a composition that contains from 0.10% by atom to 1.00% by atom (inclusive) of Pd and from 0.10% by atom to 1.00% by atom (inclusive) of Mg, with the balance made up of Ag and unavoidable impurities. Alternatively, this Ag alloy film is characterized by having a composition that contains from 0.10% by atom to 1.00% by atom (inclusive) of Pd, from 0.05% by atom to 1.00% by atom (inclusive) of Mg, and additionally from 0.01% by atom to 0.15% by atom (inclusive) of Ca, with the balance made up of Ag and unavoidable impurities.</p> |
| 申请公布号 |
WO2014088098(A1) |
申请公布日期 |
2014.06.12 |
| 申请号 |
WO2013JP82837 |
申请日期 |
2013.12.06 |
| 申请人 |
MITSUBISHI MATERIALS CORPORATION |
发明人 |
TOSHIMORI YUTO;NONAKA SOHEI;KOMIYAMA SHOZO;NAKAZAWA HIROMI;KIKUCHI FUMITAKE |
| 分类号 |
C22C5/06;C23C14/14;C23C14/34;H01B1/02;H01B5/14 |
主分类号 |
C22C5/06 |
| 代理机构 |
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